Structure and morphological study of nanometer W and W3O thin films
Résumé
In this paper, the structure of nanometer tungsten thin films has been correlated to their surface morphology. Films have been deposited by RF-sputtering at a working pressure of 0.5 Pa and with a power density of 1.18 W/cm 2. Two phases with different morphology has been observed : W 3 O with a nanograins structure is present in the first step of the tungsten growth; and, when the thickness is increased, a pure tungsten Wolfram phase (W) with a lamellar structure appears. We demonstrate that W 3 O is related to a pollution of the target surface between two growth runs. We succeed to suppress this phase and to obtain pure tungsten Wolfram nanolayer, in order to realize [W/WO 3 ] n multilayer.
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structureand morphological W and W3O - 2003.pdf (662.57 Ko)
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