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Article Dans Une Revue Thin Solid Films Année : 2003

Structure and morphological study of nanometer W and W3O thin films

Résumé

In this paper, the structure of nanometer tungsten thin films has been correlated to their surface morphology. Films have been deposited by RF-sputtering at a working pressure of 0.5 Pa and with a power density of 1.18 W/cm 2. Two phases with different morphology has been observed : W 3 O with a nanograins structure is present in the first step of the tungsten growth; and, when the thickness is increased, a pure tungsten Wolfram phase (W) with a lamellar structure appears. We demonstrate that W 3 O is related to a pollution of the target surface between two growth runs. We succeed to suppress this phase and to obtain pure tungsten Wolfram nanolayer, in order to realize [W/WO 3 ] n multilayer.
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hal-01845323 , version 1 (20-07-2018)

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Laurence Maillé, C. Sant, C. Le Paven-Thivet, C. Legrand-Buscema, Pierre Garnier. Structure and morphological study of nanometer W and W3O thin films. Thin Solid Films, 2003, 428 (1-2), pp.237 - 241. ⟨10.1016/S0040-6090(02)01277-4⟩. ⟨hal-01845323⟩
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