Investigation of the in-plane and out-of-plane electrical properties of metallic nanoparticles in dielectric matrix thin films elaborated by atomic layer deposition - Archive ouverte HAL
Article Dans Une Revue Nanotechnology Année : 2017

Investigation of the in-plane and out-of-plane electrical properties of metallic nanoparticles in dielectric matrix thin films elaborated by atomic layer deposition

Daniel Thomas
  • Fonction : Auteur
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Etienne Puyoo
Martine Le Berre
Liviu Militaru
David Albertini
Andreï Sabac
Francis Calmon

Résumé

Pt nanoparticles in a Al2O3 dielectric matrix thin films are elaborated by means of atomic layer deposition. These nanostructured thin films are integrated in vertical and planar test structures in order to assess both their in-plane and out-of-plane electrical properties. A shadow edge evaporation process is used to develop planar devices with electrode separation distances in the range of 30 nm. Both vertical and planar test structures show a Poole–Frenkel conduction mechanism. Low trap energy levels (<0.1 eV) are identified for the two test structures which indicates that the Pt islands themselves are not acting as traps in the PF mechanism. Furthermore, a more than three order of magnitude current density difference is observed between the two geometries. This electrical anisotropy is attributed to a large electron mobility difference in the in-plane and out-of-plane directions which can be related to different trap distributions in both directions.
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Dates et versions

hal-01644827 , version 1 (22-11-2017)

Identifiants

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Daniel Thomas, Etienne Puyoo, Martine Le Berre, Liviu Militaru, Siddardha Koneti, et al.. Investigation of the in-plane and out-of-plane electrical properties of metallic nanoparticles in dielectric matrix thin films elaborated by atomic layer deposition. Nanotechnology, 2017, 28 (45), 455602 (8 p.). ⟨10.1088/1361-6528/aa8b5e⟩. ⟨hal-01644827⟩
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