Porous silicon micro-resonator implemented by standard photolithography process for sensing application - Archive ouverte HAL
Journal Articles Optical Materials Year : 2017

Porous silicon micro-resonator implemented by standard photolithography process for sensing application

Abstract

A micro-resonator based on porous silicon ridge waveguides is implemented by a large scale standard photolithography process to obtain a low cost and sensitive sensor based on volume detection principle instead of the evanescent one usually used. The porous nature of the ridge waveguides allows the target molecules to be infiltrated in the core and to be detected by direct interaction with the propagated light. Racetrack resonator with radius of 100 µm and a coupling length of 70 µm is optically characterized for the volume detection of different concentrations of glucose. A high sensitivity of 560 nm/RIU is reached with only one micro-resonator and a limit of detection of 8.10-5 RIU, equivalent to a glucose concentration of 0.7 g/L, is obtained.
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Dates and versions

hal-01588507 , version 1 (15-09-2017)

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Pauline Girault, Paul Azuelos, Nathalie Lorrain, Luiz Poffo, Jonathan Lemaitre, et al.. Porous silicon micro-resonator implemented by standard photolithography process for sensing application. Optical Materials, 2017, 72, pp.596-601. ⟨10.1016/j.optmat.2017.07.005⟩. ⟨hal-01588507⟩
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