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Communication Dans Un Congrès Année : 2017

Cryogenic etching applied to the realization of high density capacitor with a homopolymer mask

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hal-01577611 , version 1 (26-08-2017)

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  • HAL Id : hal-01577611 , version 1

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Mukesh Kulsreshath, Christophe Sinturel, Philippe Lefaucheux, Marylène Vayer, Thomas Tillocher, et al.. Cryogenic etching applied to the realization of high density capacitor with a homopolymer mask. 21th International Colloquium on Plasma Processes, Jun 2017, Nice, France. ⟨hal-01577611⟩
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