CRYOGENIC ETCHING APPLIED TO THE REALIZATION OF HIGH DENSITY CAPACITOR WITH A HOMOPOLYMER MASK - Archive ouverte HAL Accéder directement au contenu
Communication Dans Un Congrès Année : 2017

CRYOGENIC ETCHING APPLIED TO THE REALIZATION OF HIGH DENSITY CAPACITOR WITH A HOMOPOLYMER MASK

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hal-01561252 , version 1 (12-07-2017)

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  • HAL Id : hal-01561252 , version 1

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Mukesh Kulsreshath, Christophe Sinturel, Philippe Lefaucheux, Marylène Vayer, Thomas Tillocher, et al.. CRYOGENIC ETCHING APPLIED TO THE REALIZATION OF HIGH DENSITY CAPACITOR WITH A HOMOPOLYMER MASK. International Conference on Plasma Processes 2017 (CIP2017), Jun 2017, Nice, France. ⟨hal-01561252⟩
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