Photoactivity enhancement of WS2 sputtered thin films by use of nickel - Archive ouverte HAL Accéder directement au contenu
Article Dans Une Revue Thin Solid Films Année : 1997

Photoactivity enhancement of WS2 sputtered thin films by use of nickel

Résumé

Photoactive thin films of WS2 have been prepared by radio frequency magnetron sputtering. Physico-chemical properties of the films are mainly investigated by Rutherford backscattering and X-ray diffraction. Optical and transport properties are also studied. Films sputtered at a high substrate temperature are made of small bidimensional grains (2H–WS2) surrounded by amorphous boundaries. The photoactivity of these films is weak because of the electron trapping at boundaries. Films sputtered at a low substrate temperature are amorphous and then annealed to produce bidimensional films. It is shown that annealed Ni-coated films give highly textured samples. A nickel–sulphur phase is assumed to act as a surfactant. The strong photoactivity enhancement of these films is attributed to an increase in the grain size.

Dates et versions

hal-01550141 , version 1 (29-06-2017)

Identifiants

Citer

O. Lignier, G. Couturier, J. Tedd, Danielle Gonbeau, J. Salardenne. Photoactivity enhancement of WS2 sputtered thin films by use of nickel. Thin Solid Films, 1997, 299 (1-2), pp.45-52. ⟨10.1016/S0040-6090(96)09319-4⟩. ⟨hal-01550141⟩
56 Consultations
0 Téléchargements

Altmetric

Partager

Gmail Facebook X LinkedIn More