Electron transport coefficients in mixtures of CF<SUB>4</SUB> and CF<SUB>2</SUB> radicals - Archive ouverte HAL Accéder directement au contenu
Article Dans Une Revue Plasma Sources Science and Technology Année : 2009

Electron transport coefficients in mixtures of CF4 and CF2 radicals

Zd Nikitovic
  • Fonction : Auteur
Vd Stojanovic
  • Fonction : Auteur
Jean-Paul Booth
Zl Petrovic
  • Fonction : Auteur

Résumé

Electron kinetics determines the rate of production of chemically active species in processing plasmas. Precise transport coefficients are needed to describe conditions such as those found in plasma assisted technologies for semiconductor production, but these are affected by the density of free radicals, which in themselves depend on the chemical kinetics. We present transport coefficients for electrons in mixtures of CF4 with CF2 (and we also show similar results for other radicals) for ratios of the electric field to the gas number density E/N from 1 to 1000 Td (1 Td = 10−21 V m2). Our analysis of non-conservative collisions revealed a range of E/N where electron attachment to radicals significantly changes the electron kinetics compared with pure CF4 gas. The results are obtained using simple solutions for Boltzmann's equation and exact Monte Carlo simulations.

Dates et versions

hal-01549497 , version 1 (28-06-2017)

Identifiants

Citer

Zd Nikitovic, Vd Stojanovic, Jean-Paul Booth, Zl Petrovic. Electron transport coefficients in mixtures of CF4 and CF2 radicals. Plasma Sources Science and Technology, 2009, 18, pp.035008. ⟨10.1088/0963-0252/18/3/035008⟩. ⟨hal-01549497⟩
52 Consultations
0 Téléchargements

Altmetric

Partager

Gmail Facebook X LinkedIn More