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Article Dans Une Revue Applied Physics Letters Année : 2012

Enhanced sheath heating in capacitively coupled discharges due to non-sinusoidal voltage waveforms

Résumé

Through the use of particle-in-cell simulations, we demonstrate that the power deposition in capacitively coupled discharges (in argon) can be increased by replacing sinusoidal waveforms with Gaussian-shaped voltage pulses (with a repetition frequency of 13.56 MHz). By changing the Gaussian pulse width, electron heating can be directly controlled, allowing for an increased plasma density and ion flux for the same gas pressure and geometrical operating conditions. Analysis of the power deposition profiles and electron distribution functions shows that enhanced electron-sheath heating is responsible for the increased power absorption.

Dates et versions

hal-01549438 , version 1 (28-06-2017)

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Trevor Lafleur, R.W. Boswell, Jean-Paul Booth. Enhanced sheath heating in capacitively coupled discharges due to non-sinusoidal voltage waveforms. Applied Physics Letters, 2012, 100, pp.194101. ⟨10.1063/1.4712128⟩. ⟨hal-01549438⟩
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