Quantum Compact Model of Drain Current in Independent Double-Gate Metal-Oxide-Semiconductor Field-Effect Transistors - Archive ouverte HAL
Article Dans Une Revue Japanese Journal of Applied Physics Année : 2011

Quantum Compact Model of Drain Current in Independent Double-Gate Metal-Oxide-Semiconductor Field-Effect Transistors

Résumé

A continuous compact model of drain current in independently driven double-gate (IDG) metal-oxide-semiconductor field-effect transistors (MOSFETs) is presented. The model describes drift-diffusion transport and is continuous over all operation regimes, which makes it very suitable for implementation in circuit simulators. Our approach takes into account two-dimensional (2D) electrostatics and vertical carrier quantum confinement in the channel through the inversion charge evaluated quantum-mechanically. The model effectively reproduces the threshold voltage and the current modulation by the back-gate bias, as well as the quantum confinement effects on the inversion charge. A full 2D quantum-mechanical numerical simulation code (solving the 2D Poisson equation self-consistently coupled with the 1D Schrodinger equation) is used to validate the model. The model is shown to fit with good accuracy the numerically simulated quantum drain current in double-gate devices with either independent or connected gates. (C) 2011 The Japan Society of Applied Physics
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Dates et versions

hal-01430093 , version 1 (09-01-2017)

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Daniela Munteanu, Jean-Luc Autran, Mathieu Moreau. Quantum Compact Model of Drain Current in Independent Double-Gate Metal-Oxide-Semiconductor Field-Effect Transistors. Japanese Journal of Applied Physics, 2011, 50 (2), ⟨10.1143/JJAP.50.024301⟩. ⟨hal-01430093⟩
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