Multiscale modeling and experimental analysis of chemical vapor deposited aluminum films : Linking reactor operating conditions with roughness evolution - Archive ouverte HAL Access content directly
Journal Articles Chemical Engineering Science Year : 2016

Multiscale modeling and experimental analysis of chemical vapor deposited aluminum films : Linking reactor operating conditions with roughness evolution

Abstract

When composition and crystallographic structure remainconstant, film properties mainly depend on microstructure and surface morphology. In this case,the proper modeling of agrowing film allows linking the final surface features with the operating conditions at the reactor scale which in turn enables the control of theproperties of the final film. In this work, an experimentally supported,coarse-grained, multiscale framework is applied for the modeling of the surface roughness of aluminum thin films processed by chemical vapor deposition from dimethylethylaminealane. The multiscale framework is developed by linking macroscopic transport phenomena based on continuum mechanics models with nanoscale surface events which are simulated stochastically. The model reproduces experimentaldata successfully,thus validating the method with good statistics. Finally,modeling of surface roughness enables the estimation of the electrical resistivity in good agreement with corresponding measurements.
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Dates and versions

hal-01412001 , version 1 (07-12-2016)

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Ioannis G. Aviziotis, Nikolaos Cheimarios, Thomas Duguet, Constantin Vahlas, Andreas G. Boudouvis. Multiscale modeling and experimental analysis of chemical vapor deposited aluminum films : Linking reactor operating conditions with roughness evolution. Chemical Engineering Science, 2016, vol. 155, pp. 449-458. ⟨10.1016/j.ces.2016.08.039⟩. ⟨hal-01412001⟩
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