GRAYSCALE LITHOGRAPHY TO FABRICATE VARYING-DEPTH NANOCHANNELS IN A SINGLE STEP

We report a new, fast and versatile method to fabricate nanochannels with non-uniform depth in a single step, in the range 50-500nm. The process is based on maskless laser lithography to structure a photosensitive resist (PR). The lateral dimension can be as small as 2µm. Functional nanofluidic chips with slopes, steps, and pore networks mimicking a nanoporous medium were fabricated and tested.

Mots clés

nanofabrication nanofluidics 3D lithography grayscale lithography

Domaines

Micro et nanotechnologies/Microélectronique Dynamique des Fluides [physics.flu-dyn]

Fichier principal

MicroTAS2016_0723.pdf (218.46 Ko)

Origine	Fichiers produits par l'(les) auteur(s)

Pierre JOSEPH : Connectez-vous pour contacter le contributeur

https://hal.science/hal-01391501

Soumis le : lundi 7 novembre 2016-11:03:49

Dernière modification le : vendredi 12 avril 2024-15:48:52

Archivage à long terme le : mercredi 8 février 2017-12:25:17

Dates et versions

hal-01391501 , version 1 (07-11-2016)

Identifiants

HAL Id : hal-01391501 , version 1

Citer

Antoine Naillon, Hajar Massadi, Rémi Courson, Pierre-François Calmon, Lucie Seveno, et al.. GRAYSCALE LITHOGRAPHY TO FABRICATE VARYING-DEPTH NANOCHANNELS IN A SINGLE STEP. The 20th International Conference on Miniaturized Systems for Chemistry and Life Sciences, MicroTAS, CBMS, Oct 2016, Dublin, Ireland. ⟨hal-01391501⟩

Exporter

BibTeX XML-TEI Dublin Core DC Terms EndNote DataCite

Collections

UNIV-TLSE2 CNRS INSA-TOULOUSE LAAS UT1-CAPITOLE LAAS-TEAM LAAS-MICRO-NANO-BIO-TECHNOLOGIES LAAS-MILE LAAS-SYSTEMES-COMPLEXES INSA-GROUPE IMFT TOULOUSE-INP UNIV-UT3 UT3-TOULOUSEINP

213 Consultations

461 Téléchargements