Graphene-HfO2-based resistive RAM memories - Archive ouverte HAL
Article Dans Une Revue Microelectronic Engineering Année : 2016

Graphene-HfO2-based resistive RAM memories

Résumé

Graphene, a two dimensional material with remarkable electronic properties, has attracted a huge interest among scientist during the last decade. We report the fabrication of Graphene-HfO2-based resistive RAM memories. We insert graphene layers between the oxide layer and the gold top electrode resulting in stabilization of a low resistance state stability without applied voltage, contrary to behaviour observed for identical graphene free memory devices. Graphene here is used as an oxygen reservoir and contribute to the switching mechanism. (C) 2016 Elsevier B.V. All rights reserved.

Domaines

Matériaux
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Dates et versions

hal-01378826 , version 1 (10-10-2016)

Identifiants

Citer

Cédric Mannequin, Alexandru Delamoreanu, Laurence Latu-Romain, Vincent Jousseaume, Helen Grampeix, et al.. Graphene-HfO2-based resistive RAM memories. Microelectronic Engineering, 2016, 161, pp.82 - 86. ⟨10.1016/j.mee.2016.04.009⟩. ⟨hal-01378826⟩
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