The influence of the pressure on the microstructure of yttria-stabilized zirconia thin films deposited by dual magnetron sputtering - Archive ouverte HAL Accéder directement au contenu
Article Dans Une Revue Vacuum Année : 2016

The influence of the pressure on the microstructure of yttria-stabilized zirconia thin films deposited by dual magnetron sputtering

Résumé

Mixed oxide thin films, such as yttria-stabilized zirconia, deposited by dual reactive magnetron sputtering on a non-rotating substrate show a typical microstructure of bended, or tilted columns. Two effects define the tilt. The first effect is the compositional gradient over each column which results in a different lattice spacing. To accommodate this difference, the column bends. As such, the chemical composition has a major influence on the final columnar tilt. The second effect is ballistic shadowing which is controlled by the pressure-distance product. At higher pressure-distances, this second effect plays a more prominent role, and a different behaviour of the columnar tilt as a function of the film composition is noticed. The experimental trends can be understood by the use of a particle trajectory code which provides the angular and energy distribution of the atoms to a ballistic aggregation Monte Carlo code simulating the resulting microstructure.
Fichier principal
Vignette du fichier
LABOMAP_VACUUM_2016_BESNARD.pdf (1.19 Mo) Télécharger le fichier
Origine : Fichiers produits par l'(les) auteur(s)
Loading...

Dates et versions

hal-01333434 , version 1 (17-06-2016)

Identifiants

Citer

Diederik Depla, Aurélien Besnard, Jerika Lamas. The influence of the pressure on the microstructure of yttria-stabilized zirconia thin films deposited by dual magnetron sputtering. Vacuum, 2016, 125, pp.118-122. ⟨10.1016/j.vacuum.2015.12.013⟩. ⟨hal-01333434⟩
52 Consultations
155 Téléchargements

Altmetric

Partager

Gmail Facebook X LinkedIn More