Mastering the biaxial stress state in nanometric thin films on flexible substrates - Archive ouverte HAL
Article Dans Une Revue Applied Surface Science Année : 2014

Mastering the biaxial stress state in nanometric thin films on flexible substrates

Résumé

Biaxial stress state of thin films deposited on flexible substrate can be mastered thanks to a new biaxial device. This tensile machine allows applying in-plane loads F-x and F-y in the two principal directions x and y of a cruciform-shaped polymer substrate. The transmission of the deformation at film/substrate interface allows controlling the stress and strain field in the thin films. We show in this paper a few illustrations dealing with strain measurements in polycrystalline thin films deposited on flexible substrate. The potentialities of the biaxial device located at Soleil synchrotron are also discussed.
Fichier non déposé

Dates et versions

hal-01293582 , version 1 (25-03-2016)

Identifiants

Citer

D. Faurie, P. -O. Renault, Éric Le Bourhis, Guillaume Geandier, Philippe Goudeau, et al.. Mastering the biaxial stress state in nanometric thin films on flexible substrates. Applied Surface Science, 2014, 306, pp.70-74. ⟨10.1016/j.apsusc.2014.02.032⟩. ⟨hal-01293582⟩
92 Consultations
0 Téléchargements

Altmetric

Partager

More