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Poster De Conférence Année : 2015

Multistep magnetron sputter process for deposition of thick, dense fully oxidized YSZ films with high deposition rates

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Matériaux
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hal-01290715 , version 1 (18-03-2016)

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  • HAL Id : hal-01290715 , version 1

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Coddet Pierre-Laurent, Amaël Caillard, Julien Vuillet, Caroline Richard, Anne-Lise Thomann. Multistep magnetron sputter process for deposition of thick, dense fully oxidized YSZ films with high deposition rates. 4th MIATEC and 14th RDS 2015 , Dec 2015, Paris, France. ⟨hal-01290715⟩
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