Growth of a strained epitaxial film on a patterned substrate - Archive ouverte HAL
Article Dans Une Revue Comptes Rendus. Physique Année : 2013

Growth of a strained epitaxial film on a patterned substrate

Xianbin Xu
  • Fonction : Auteur
Jean-Noël Aqua
  • Fonction : Auteur
  • PersonId : 1002288

Résumé

We study the influence of the growth kinetics on the Asaro-Tiller-Grinfel'd instability of a thin film deposited on a patterned substrate. We use a continuum model that we solve at first order in the surface slope. Both wetting interactions and elastic fields induced by the film/substrate interface introduce an explicit dependence on the film thickness. As a consequence, the translational symmetry in the growth direction is broken and the deposition flux cannot be trivially accounted for. Similarly to the evolution during annealing, the instability can skip during growth from an in-phase to an out-of-phase geometry depending on the growth duration and film thickness. We compare the evolution of the instability using different deposition fluxes. We find that the kinetic phase diagram found in the annealing case also explains the evolution during growth in usual growth conditions. (C) 2012 Academie des sciences. Published by Elsevier Masson SAS. All rights reserved.
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Dates et versions

hal-01238957 , version 1 (07-12-2015)

Identifiants

Citer

Xianbin Xu, Jean-Noël Aqua, Thomas Frisch. Growth of a strained epitaxial film on a patterned substrate. Comptes Rendus. Physique, 2013, 14 (2-3), pp.199-207. ⟨10.1016/j.crhy.2012.11.006⟩. ⟨hal-01238957⟩
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