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Communication Dans Un Congrès Année : 2015

Reduction of plasma induced damage of porous low-k materials using a cryogenic etching process

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hal-01228448 , version 1 (13-11-2015)

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  • HAL Id : hal-01228448 , version 1

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Thomas Tillocher, Floriane Leroy, Liping Zhang, Philippe Lefaucheux, Koichi Yatsuda, et al.. Reduction of plasma induced damage of porous low-k materials using a cryogenic etching process. 22nd International Symposium on Plasma Chemistry (ISPC 2015), Jul 2015, Antwerp, Belgium. ⟨hal-01228448⟩
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