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Communication Dans Un Congrès Année : 2015

Cryogenic Etching of Silicon with SF6/O2/SiF4 plasmas: a modeling and experimental study

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hal-01151530 , version 1 (13-05-2015)

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  • HAL Id : hal-01151530 , version 1

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Stefan Tinck, Erik Neyts, Thomas Tillocher, Remi Dussart, Annemie Bogaerts. Cryogenic Etching of Silicon with SF6/O2/SiF4 plasmas: a modeling and experimental study. Plasma Etch and Strip in Microtechnology, Apr 2015, Leuven, Belgium. ⟨hal-01151530⟩
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