XPS study of Ni-base alloys oxide films formed in primary conditions of pressurized water reactor - Archive ouverte HAL
Article Dans Une Revue Surface and Interface Analysis Année : 2015

XPS study of Ni-base alloys oxide films formed in primary conditions of pressurized water reactor

Résumé

The oxide scales formed on alloy 690 during its exposure to pressurized water reactor primary simulated media at 325 °C for different periods, ranging between 24 and 858 h have been characterized through XPS analysis. These results have been compared with the data obtained on Cr2O3, NiCr2O4, NiFe2O4, and Ni(OH)2 reference compounds. This comparison leads to the following conclusions about the scale formed on alloy 690: (i) the deconvolution of Cr-2p3/2 core level spectra seems to show that the internal oxide scale is made of a mix of chromite and chromia; (ii) the evolution of the height ratio between satellite and principal peaks, on the Ni-2p3/2 core level, has highlighted the presence of nickel hydroxide for all corrosion durations; and (iii) XPS analysis can be used to study the kinetics of nickel ferrite precipitation. In order to obtain a more complete description of such oxide scales based upon XPS measurements, reference data, obtained on nickel ferrites and chromites in which Fe is partially substituted to Ni, are needed. The comparison of published data and reference spectra performed in this work also leads to conclude that core level fits are dependent on the energy resolution, which can be achieved with specific spectrometer and analysis procedures. Therefore, reference compound spectra need to be recorded in the very identical analytical configuration before dealing with results obtained on corroded specimen.
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Dates et versions

hal-01134217 , version 1 (05-05-2015)

Identifiants

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Loic Marchetti, Frédéric Miserque, Stéphane Perrin, Michèle Pijolat. XPS study of Ni-base alloys oxide films formed in primary conditions of pressurized water reactor. Surface and Interface Analysis, 2015, 47 (5), pp.632-642. ⟨10.1002/sia.5757⟩. ⟨hal-01134217⟩
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