Recently, deep ultraviolet (DUV) lithography systems through the development of new chemically amplified (CA) photoresist emerge as novel procedure to achieve the new requirements of photonic circuit integration so as to develop high density of photonic circuitry at submicrometer scales through low cost and large production scales. Here we report the design, fabrication, optical characterization and thermal tuning responses of cascade of multiple microresonators (MR) developed on the CA UV210 polymer by DUV lithography procedures. Families of various MR have been investigated with different shapes and geometrical dimensions. Scanning electron microscopy (SEM) supports the fabrication quality. The experimental TE modes resonance transmissions show a relevant agreement in the period of the resonances theoretically expected. A systematical study through Q-factor has been performed for the devices based on single and multiple resonators. Cascade of multiple loops demonstrates enhancement of the optical transmission properties respect to the photonic devices with only one cavity and the ability to act as modal filter by providing more uniform pass band over a wider wavelength range. Maxima values of Q = 4 x 10^3 were obtained for the cascade of triple racetrack MR. In addition, by using a heater tip (alloy NiCr) on top of the devices, we demonstrate the thermally tunable response through cascade of three racetrack MR and validate the ability of such systems as thermal sensors applications. The experimental linear resonance shift obtained was equal to 0.19 ± 0.018 nm/°C which give a thermo-optic effect ~ -10^-4/°C. Furthermore, the tunability accuracy has been confirmed by changing the top cladding of the devices from air to distilled water, leading to respectively a red and blue shift on the evolution of the resonance transmission.