Chemical analysis of H2/CH4 and H2/CH4/B2H6 high pressure-high power microwave plasma using TDLAS and OES techniques - Archive ouverte HAL
Communication Dans Un Congrès Année : 2014

Chemical analysis of H2/CH4 and H2/CH4/B2H6 high pressure-high power microwave plasma using TDLAS and OES techniques

Résumé

Microwave H2/CH4 and H2/CH4/B2H6 plasmas used for diamond deposition have been investigated by Infrared Tunable Diode Laser Absorption Spectroscopy (IR TDLAS) and Optical Emission Spectroscopy (OES) techniques in order to monitor six different molecular species CH4, C2H2, C2H4, C2H6, B2H6 and B.

Domaines

Plasmas Optique / photonique

Maxime Wartel  : Connectez-vous pour contacter le contributeur

https://hal.science/hal-01056873

Soumis le : mercredi 20 août 2014-16:34:04

Dernière modification le : jeudi 28 novembre 2024-10:49:59

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Dates et versions

hal-01056873 , version 1 (20-08-2014)

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  • HAL Id : hal-01056873 , version 1

Citer

C. Rond, S. Hamann, M. Wartel, G. Lombardi, A. Gicquel, et al.. Chemical analysis of H2/CH4 and H2/CH4/B2H6 high pressure-high power microwave plasma using TDLAS and OES techniques. 6th International Workshop on Plasma Spectroscopy, Jun 2014, Hoboken, United States. ⟨hal-01056873⟩

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