Influence of the HiPIMS voltage on the time resolved platinum ions energy distributions
Résumé
High Power Impulse magnetron sputtering (HiPIMS) is a common way to create a high and dense ionized metallic vapor without the use of an alternative ionizing device, like radio frequency loops. HiPIMS has been used to perform the deposition of platinum thin films in order to control their morphology. This feature known to depend on the energy of the Pt species incoming onto the substrate during the deposition has to be carefully studied. Therefore, it's necessary to study the ions energy distribution during the sputtering pulse and to follow its evolution with the HiPIMS regime. Pictures of this evolution are presented.
Domaines
Plasmas| Origine | Fichiers produits par l'(les) auteur(s) |
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