Hyperbranched Polymers for Photolithographic Applications - Towards Understanding the Relationship between Chemical Structure of Polymer Resin and Lithographic Performances - Archive ouverte HAL Access content directly
Journal Articles Advanced Materials Year : 2009

Hyperbranched Polymers for Photolithographic Applications - Towards Understanding the Relationship between Chemical Structure of Polymer Resin and Lithographic Performances

Olivier Soppera

Abstract

A chemically amplified resist based on a hyperbranched polymer resin is demonstrated for the first time. The hyperbranched polymer is synthesized using the atom-transfer radical polymerization (ATRP) technique, and resists prepared from this hyperbranched polymer present good pattern profiles and line-edge roughness (3 sigma) values comparable to those of the reference (commercial) resist.
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hal-00945178 , version 1 (11-02-2014)

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Christos L. Chochos, Esma Ismailova, Cyril Brochon, Nicolas Leclerc, Raluca Tiron, et al.. Hyperbranched Polymers for Photolithographic Applications - Towards Understanding the Relationship between Chemical Structure of Polymer Resin and Lithographic Performances. Advanced Materials, 2009, 21 (10-11), pp.1121-1125. ⟨10.1002/adma.200801715⟩. ⟨hal-00945178⟩
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