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Communication Dans Un Congrès Année : 2007

Impact of reactor walls chemical composition on radicals' densities in the chlorine based silicon etching ICP plasmas

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hal-00944971 , version 1 (11-02-2014)

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  • HAL Id : hal-00944971 , version 1

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N. Sadeghi, G. Cunge, R. Ramos. Impact of reactor walls chemical composition on radicals' densities in the chlorine based silicon etching ICP plasmas. 18th International Symposium on Plasma Chemistry (ISPC), Aug 2007, Kyoto, Japan. ⟨hal-00944971⟩
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