Interferometric measurement of the temperature dependence of an index of refraction: application to fused silica - Archive ouverte HAL
Article Dans Une Revue Applied optics Année : 2010

Interferometric measurement of the temperature dependence of an index of refraction: application to fused silica

Résumé

The light reflected by an uncoated Fabry-Perot etalon presents dark rings which give a very sensitive measurement of the variations of the return optical path in the etalon. By measuring the diameters of these rings as a function of the etalon temperature T, we get a sensitive measurement of the derivative dn/dT of the index of refraction n. We have made this experiment with a fused silica etalon and we have achieved a 2% relative uncertainty on dn/dT , comparable to the uncertainty of the best experiments.
Fichier non déposé

Dates et versions

hal-00915847 , version 1 (09-12-2013)

Identifiants

Citer

Paul-Edouard Dupouy, Matthias Büchner, Philippe Paquier, Gérard Trénec, Jacques Vigué. Interferometric measurement of the temperature dependence of an index of refraction: application to fused silica. Applied optics, 2010, 49 (4), pp.678-682. ⟨10.1364/AO.49.000678⟩. ⟨hal-00915847⟩
147 Consultations
0 Téléchargements

Altmetric

Partager

More