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Communication Dans Un Congrès Année : 2013

MD Simulations of Pulsed Chlorine Plasmas Interaction with Ultrathin Silicon Films for Advanced Etch Processes

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hal-00904431 , version 1 (14-11-2013)

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  • HAL Id : hal-00904431 , version 1

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P. Brichon, E. Despiau-Pujo, G. Cunge, Maxime Darnon, O. Joubert. MD Simulations of Pulsed Chlorine Plasmas Interaction with Ultrathin Silicon Films for Advanced Etch Processes. American Vacuum Society 60th International Symposium, Oct 2013, Long beach, United States. ⟨hal-00904431⟩
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