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Article Dans Une Revue Surface and Coatings Technology Année : 2013

Interdependence of structural and electrical properties in tantalum/tantalum oxide multilayers

Résumé

Dc reactive sputtering was used to deposit tantalum metal/oxide periodic nanometric multilayers using the innovative technique namely, the reactive gas pulsing process (RGPP). Different pulsing periods were used for each deposition to produce metal-oxide periodic alternations included between 5 and 80 nm. Structure, crystallinity and chemical composition of these films were systematically investigated by Transmission Electron Microscopy (TEM) and Energy-dispersive X-ray (EDX) spectroscopy techniques. Moreover, electrical properties were also studied by the Van der Pauw technique.
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Dates et versions

hal-00875700 , version 1 (22-10-2013)

Identifiants

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Arnaud Cacucci, Stéphane Loffredo, Valérie Potin, Luc Imhoff, Nicolas Martin. Interdependence of structural and electrical properties in tantalum/tantalum oxide multilayers. Surface and Coatings Technology, 2013, 227, pp.38 - 41. ⟨10.1016/j.surfcoat.2012.10.064⟩. ⟨hal-00875700⟩
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