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Communication Dans Un Congrès Année : 2004

Low temperature amorphous and nanocrystralline silicon thin film transistors deposited by Hot-Wire CVD on glass substrate

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hal-00848000 , version 1 (25-07-2013)

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  • HAL Id : hal-00848000 , version 1

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M. Fonrodona, D. Soler, J. Escarré, F. Villar, J. Bertomeu, et al.. Low temperature amorphous and nanocrystralline silicon thin film transistors deposited by Hot-Wire CVD on glass substrate. 3rd International Conference on Hot-Wire CVD (Cat-CVD), Aug 2004, Utrecht, Netherlands. ⟨hal-00848000⟩
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