Sheet resistance of multi-layer stacking of silicene - Archive ouverte HAL Accéder directement au contenu
Communication Dans Un Congrès Année : 2013

Sheet resistance of multi-layer stacking of silicene

Fichier non déposé

Dates et versions

hal-00819685 , version 1 (02-05-2013)

Identifiants

  • HAL Id : hal-00819685 , version 1

Citer

Pierre Capiod, Maxime Berthe, Andrea Resta, Paola de Padova, Patrick Vogt, et al.. Sheet resistance of multi-layer stacking of silicene. European Materials Research Society Spring Meeting, E-MRS Spring 2013, Symposium I - The route to post-Si CMOS devices : from high mobility channels to graphene-like 2D nanosheets, 2013, Strasbourg, France. ⟨hal-00819685⟩
22 Consultations
0 Téléchargements

Partager

Gmail Facebook X LinkedIn More