Sheet resistance of multi-layer stacking of silicene - Archive ouverte HAL Access content directly
Conference Papers Year : 2013
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hal-00819685 , version 1 (02-05-2013)

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  • HAL Id : hal-00819685 , version 1

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Pierre Capiod, Maxime Berthe, Andrea Resta, Paola de Padova, Patrick Vogt, et al.. Sheet resistance of multi-layer stacking of silicene. European Materials Research Society Spring Meeting, E-MRS Spring 2013, Symposium I - The route to post-Si CMOS devices : from high mobility channels to graphene-like 2D nanosheets, 2013, Strasbourg, France. ⟨hal-00819685⟩
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