Characteristics of the surface microstructures in thick InGaN layers on GaN - Archive ouverte HAL
Article Dans Une Revue Optical Materials Express Année : 2013

Characteristics of the surface microstructures in thick InGaN layers on GaN

Résumé

This paper focuses on a comparative study of optical, morphological, microstructural and microcompositional properties of typical InGaN samples which exhibit V-defects but also two additional surface defects features, referred to as inclusion#1 (Ic1) and inclusion#2 (Ic2). HR-XRD, AFM, SEM, STEM and EDX are used to characterize such defects. Furthermore, hyperspectral mapping, spot mode and depth-resolved CL measurements provided useful informations on the optical emission properties and microstructure. The main characteristic of Ic1 luminescence peak is a decrease in intensity and no obvious shift in the CL peak position when going from the outside to the middle of such defect. More interesting was Ic2 which is shown to be local 3D top surface In-rich InGaN domains embedded in an homogeneous InGaN matrix. In fact, this study pointed out that close to the interface GaN/InGaN, it exists a 30 nm thick fully strained InGaN layer with constant indium incorporation. As the growth proceeds spatial fluctuation of the In content is observed and local In-rich 3D domains are shown to emerge systematically around threading dislocations terminations.

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hal-00815384 , version 1 (18-04-2013)

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Y. El Gmili, G. Orsal, K. Pantzas, A. Ahaitouf, T. Moudakir, et al.. Characteristics of the surface microstructures in thick InGaN layers on GaN. Optical Materials Express, 2013, 3, pp.1111-1118. ⟨10.1364/OME.3.001111⟩. ⟨hal-00815384⟩
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