Article Dans Une Revue Journal of Physics D: Applied Physics Année : 2012

Effect of O2, Ar/H2 and CF4 plasma treatments on the structural and dielectric propoerties of parylene-C thin films

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hal-00815148 , version 1 (18-04-2013)

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Abdelkader Kahouli, Alain Sylvestre, Sébastien Pairis, Jean-Luc Garden, Emmanuel André, et al.. Effect of O2, Ar/H2 and CF4 plasma treatments on the structural and dielectric propoerties of parylene-C thin films. Journal of Physics D: Applied Physics, 2012, 45 (21), pp.215306. ⟨10.1088/0022-3727/45/21/215306⟩. ⟨hal-00815148⟩
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