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Article Dans Une Revue Journal of Micromechanics and Microengineering Année : 2012

ICP polishing of silicon for high quality optical resonators on a chip

Résumé

Miniature concave hollows, made by wet etching silicon through a circular mask, can be used as mirror substrates for building optical micro-cavities on a chip. In this paper we investigate how ICP polishing improves both shape and roughness of the mirror substrates. We characterise the evolution of the surfaces during the ICP polishing using white-light optical profilometry and atomic force microscopy. A surface roughness of 1 nm is reached, which reduces to 0.5 nm after coating with a high reflectivity dielectric. With such smooth mirrors, the optical cavity finesse is now limited by the shape of the underlying mirror.
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Dates et versions

hal-00796166 , version 1 (01-03-2013)

Identifiants

  • HAL Id : hal-00796166 , version 1

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Athanasios Laliotis, Michael Trupke, Joe C. Cotter, Gareth Lewis, Michael Kraft, et al.. ICP polishing of silicon for high quality optical resonators on a chip. Journal of Micromechanics and Microengineering, 2012, 22 (12), pp.125011. ⟨hal-00796166⟩
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