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Article Dans Une Revue Journal of Vacuum Science and Technology Année : 2012

Silicon recess minimization during gate patterning using synchronous plasma pulsing

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hal-00777317 , version 1 (17-01-2013)

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C. Petit-Etienne, E. Pargon, S. David, Maxime Darnon, L. Vallier, et al.. Silicon recess minimization during gate patterning using synchronous plasma pulsing. Journal of Vacuum Science and Technology, 2012, pp.B 30, 040604. ⟨10.1116/1.4737125⟩. ⟨hal-00777317⟩
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