Cw Argon Laser Crystallization of Silicon Films : Structural properties - Archive ouverte HAL Access content directly
Conference Papers Year : 2005
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hal-00776201 , version 1 (15-01-2013)

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  • HAL Id : hal-00776201 , version 1

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J.F. Michaud, Regis Rogel, Tayeb Mohammed-Brahim, Michel Sarret. Cw Argon Laser Crystallization of Silicon Films : Structural properties. Int. Conf. Amorphous and Nanocrystalline Semiconductors (ICANS'21), Sep 2005, Lisbonne, Portugal. ⟨hal-00776201⟩
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