Low-temperature transition to a superconducting phase in boron-doped silicon films grown on (001)-oriented silicon wafers - Archive ouverte HAL
Article Dans Une Revue Physical Review B: Condensed Matter and Materials Physics (1998-2015) Année : 2010

Low-temperature transition to a superconducting phase in boron-doped silicon films grown on (001)-oriented silicon wafers

Résumé

We report on a detailed analysis of the superconducting properties of boron-doped silicon films grown along the 001 direction by gas immersion laser doping. The doping concentration c(B) has been varied up to similar to 10 at. % by increasing the number of laser shots to 500. No superconductivity could be observed down to 40 mK for doping level below similar to 2 at. %. The critical temperature T(c) then increased steeply to reach similar to 0.6 K for c(B) similar to 8 at. %. No hysteresis was found for the transitions in magnetic field, which is characteristic of a type II superconductor. The corresponding upper critical field mu(o)H(c2) (0) was on the order of 1000 G, much smaller than the value previously reported by Bustarret et al. [E. Bustarret et al., Nature (London) 444, 465 (2006)].

Dates et versions

hal-00739727 , version 1 (08-10-2012)

Identifiants

Citer

C. Marcenat, Jozef Kacmarcik, R. Piquerel, Philipp Achatz, G. Prudon, et al.. Low-temperature transition to a superconducting phase in boron-doped silicon films grown on (001)-oriented silicon wafers. Physical Review B: Condensed Matter and Materials Physics (1998-2015), 2010, 81 (2), pp.020501. ⟨10.1103/PhysRevB.81.020501⟩. ⟨hal-00739727⟩
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