LO-phonon-assisted polariton lasing in a ZnO-based microcavity - Archive ouverte HAL Access content directly
Journal Articles Physical Review B: Condensed Matter and Materials Physics (1998-2015) Year : 2012

LO-phonon-assisted polariton lasing in a ZnO-based microcavity

Christelle Brimont
Thierry Guillet

Abstract

Polariton relaxation mechanisms are analyzed experimentally and theoretically in a ZnO-based polariton laser. A minimum lasing threshold is obtained when the energy difference between the exciton reservoir and the bottom of the lower polariton branch is resonant with the LO phonon energy. Tuning off this resonance increases the threshold, and exciton-exciton scattering processes become involved in the polariton relaxation. These observations are qualitatively reproduced by simulations based on the numerical solution of the semiclassical Boltzmann equations.
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Dates and versions

hal-00710694 , version 1 (07-06-2021)

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Laurent Orosz, François Réveret, François Médard, Pierre Disseix, Joël Leymarie, et al.. LO-phonon-assisted polariton lasing in a ZnO-based microcavity. Physical Review B: Condensed Matter and Materials Physics (1998-2015), 2012, 85, pp.121201. ⟨10.1103/PhysRevB.85.121201⟩. ⟨hal-00710694⟩
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