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Article Dans Une Revue Microelectronic Engineering Année : 2011

Characterization of ion/electron beam induced deposition of electrical contacts at the sub-μm scale

D. Brunel
  • Fonction : Auteur
David Troadec
D. Hourlier
D. Deresmes
M. Zdrojek
  • Fonction : Auteur
Thierry Melin

Résumé

We investigate the fabrication of electrical contacts using ion (IBID) - and electron-beam induced deposition (EBID) of platinum at the sub-µm scale. Halos associated with the metal surface decoration in the 0.05-2 µm range are characterized electrically using transport measurements, conducting atomic force microscopy and Kelvin force microscopy. In contrast with IBID, EBID electrodes exhibit weakly conductive halos at the sub-µm scale, and can thus be used to achieve resist-free electrical contacts for transport measurements at the sub-µm scale. To show this, fourpoint transport measurements using µm-spaced EBID contacts are provided in the case of a multiwalled carbon nanotube.
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Dates et versions

hal-00603003 , version 1 (12-07-2022)

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D. Brunel, David Troadec, D. Hourlier, D. Deresmes, M. Zdrojek, et al.. Characterization of ion/electron beam induced deposition of electrical contacts at the sub-μm scale. Microelectronic Engineering, 2011, 88 (7), pp.1569-1572. ⟨10.1016/j.mee.2011.03.011⟩. ⟨hal-00603003⟩

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