Characterization of ion/electron beam induced deposition of electrical contacts at the sub-μm scale
Résumé
We investigate the fabrication of electrical contacts using ion (IBID) - and electron-beam induced deposition (EBID) of platinum at the sub-µm scale. Halos associated with the metal surface decoration in the 0.05-2 µm range are characterized electrically using transport measurements, conducting atomic force microscopy and Kelvin force microscopy. In contrast with IBID, EBID electrodes exhibit weakly conductive halos at the sub-µm scale, and can thus be used to achieve resist-free electrical contacts for transport measurements at the sub-µm scale. To show this, fourpoint transport measurements using µm-spaced EBID contacts are provided in the case of a multiwalled carbon nanotube.
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