Deep reactive etching ion etching of thermally co-evaporated Te-Ge films for IR integrated optics components - Archive ouverte HAL Accéder directement au contenu
Article Dans Une Revue Microelectronic Engineering Année : 2011

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hal-00524673 , version 1 (08-10-2010)

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Caroline Vigreux, Séverine de Sousa, Véronique Foucan, Eléonore Barthélémy, Annie Pradel. Deep reactive etching ion etching of thermally co-evaporated Te-Ge films for IR integrated optics components. Microelectronic Engineering, 2011, 88, pp.222. ⟨10.1016/j.mee.2010.10.008⟩. ⟨hal-00524673⟩
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