Communication Dans Un Congrès Année : 2009

Chemical Vapour Deposition and Atomic layer Deposition processes of amorphous or nanocrystalline thin films

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hal-00488402 , version 1 (01-06-2010)

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E. Blanquet, A. Mantoux, M. Pons, C. Vahlas. Chemical Vapour Deposition and Atomic layer Deposition processes of amorphous or nanocrystalline thin films. International Symposium on Metastable, Amorphous and Nanostructured Materials (ISMANAM 2009), Jul 2009, Pékin, China. ⟨10.1016/j.jallcom.2010.03.205⟩. ⟨hal-00488402⟩

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