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Communication Dans Un Congrès Année : 2009

Fluorinated mold treatment regeneration and low-reactivity resists in UV-nanoimprint lithography

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hal-00455227 , version 1 (09-02-2010)

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  • HAL Id : hal-00455227 , version 1

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R. Sood, C. Alleaume, C. Iojoiu, D. Boutry, A. Beaurain, et al.. Fluorinated mold treatment regeneration and low-reactivity resists in UV-nanoimprint lithography. Nanoimprint and Nanoprint Technology conference - NNT 2009, nov. 2009, San Jose (USA), 2009, san jose, United States. ⟨hal-00455227⟩
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