Dust formation in Ar/CH4 and Ar/C2H2 plasmas
Résumé
This paper discusses the growth of nanoparticles in capacitively and inductively coupled radio-frequency plasmas operated in hydrocarbon gases and the back-reaction of particles on the plasma properties. The focus is on the growth mechanism in CH4- and C2H2-containing plasmas, on the role of atomic hydrogen and on the dynamic charging and decharging of particles in pulsed plasmas.