Ordered mesoporous silica and alumina thin films studied by X-ray scattering - Archive ouverte HAL
Communication Dans Un Congrès Année : 2002

Ordered mesoporous silica and alumina thin films studied by X-ray scattering

M. Klotz
  • Fonction : Auteur
N. Idrissi-Kandri
  • Fonction : Auteur
Andre Ayral
Arie van Der Lee
C. Guizard
  • Fonction : Auteur

Résumé

The use of X-ray techniques for the characterisation of ordered mesoporous films is demonstrated. Both silica and alumina thin layers with an ordered mesoporosity are studied using low-angle diffraction and grazing incidence reflectometry. It is shown how the internal structure evolves upon drying and how texture can be easily detected using a two-circle diffractometer. The reflectometry data are correlated with results from nitrogen adsorption/desorption experiments.
Fichier non déposé

Dates et versions

hal-00451860 , version 1 (01-02-2010)

Identifiants

  • HAL Id : hal-00451860 , version 1

Citer

M. Klotz, N. Idrissi-Kandri, Andre Ayral, Arie van Der Lee, C. Guizard. Ordered mesoporous silica and alumina thin films studied by X-ray scattering. X-Ray and Matter Conference (RX 2001), Dec 2001, STRASBOURG (FRANCE), France. pp.283-289. ⟨hal-00451860⟩
66 Consultations
0 Téléchargements

Partager

More