Structural, optical and electrical properties of hydrogenated amorphous silicon germanium (a-Si1-xGex) deposited by DC magnetron sputtering at high rate - Archive ouverte HAL Accéder directement au contenu
Article Dans Une Revue Materials Science in Semiconductor Processing Année : 2006
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hal-00437287 , version 1 (30-11-2009)

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Abdelkrim Fedala, Rabah Cherfi, M. Aoucher, Tayeb Mohammed-Brahim. Structural, optical and electrical properties of hydrogenated amorphous silicon germanium (a-Si1-xGex) deposited by DC magnetron sputtering at high rate. Materials Science in Semiconductor Processing, 2006, 9 (4-5), pp.690-693. ⟨hal-00437287⟩
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