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Article Dans Une Revue Micron Année : 2008

Elaboration and characterization of barium silicate thin films.

Résumé

Room temperature depositions of barium on a thermal silicon oxide layer were performed in ultra high vacuum (UHV). In-situ X-ray photoelectron spectroscopy (XPS) analyses were carried out as well after exposure to air as after subsequent annealings. These analyses were ex-situ completed by secondary ion mass spectrometry (SIMS) profiles and transmission electron microscopy (TEM) cross-sectional images. The results showed that after air exposure, the barium went carbonated. Annealing at sufficient temperature permitted to decompose the carbonate to benefit of a barium silicate. The silicate layer was formed by interdiffusion of barium with the initial SiO2 layer.

Dates et versions

hal-00432371 , version 1 (16-11-2009)

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T. Genevès, B. Domenichini, L. Imhoff, V. Potin, O. Heintz, et al.. Elaboration and characterization of barium silicate thin films.. Micron, 2008, 39, pp.1145-1148. ⟨10.1016/j.micron.2008.05.010⟩. ⟨hal-00432371⟩
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