KTa0.5Nb0.5O3 ferroelectric thin films grown by Pulsed Laser Deposition: structural characteristics and applications to microwave devices - Archive ouverte HAL Accéder directement au contenu
Communication Dans Un Congrès Année : 2007

KTa0.5Nb0.5O3 ferroelectric thin films grown by Pulsed Laser Deposition: structural characteristics and applications to microwave devices

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hal-00403017 , version 1 (08-07-2009)

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  • HAL Id : hal-00403017 , version 1

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Arnaud-Gides Moussavou, Stéphanie Députier, André Perrin, Ronan Sauleau, Xavier Castel, et al.. KTa0.5Nb0.5O3 ferroelectric thin films grown by Pulsed Laser Deposition: structural characteristics and applications to microwave devices. LPSD 2007 "Laser Processing for Semiconductor Device: Science and Technology", Oct 2007, Saint-Malo, France. ⟨hal-00403017⟩
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