Understanding the impact of chamber walls during plasma etching: a key to control plasma processes in ULSI - Archive ouverte HAL Accéder directement au contenu
Communication Dans Un Congrès Année : 2006

Understanding the impact of chamber walls during plasma etching: a key to control plasma processes in ULSI

Fichier non déposé

Dates et versions

hal-00400472 , version 1 (30-06-2009)

Identifiants

  • HAL Id : hal-00400472 , version 1

Citer

R. Ramos, G. Cunge, O. R. Joubert, M. Orlowski, T. Lill. Understanding the impact of chamber walls during plasma etching: a key to control plasma processes in ULSI. 53rd International AVS Symposium & Topical Conferences, 2006, san francisco, United States. ⟨hal-00400472⟩
55 Consultations
0 Téléchargements

Partager

Gmail Facebook X LinkedIn More