First evidence of dielectric loss effects with ultra low-k materials and impact on interconnect propagation performance - Archive ouverte HAL Accéder directement au contenu
Communication Dans Un Congrès Année : 2008

First evidence of dielectric loss effects with ultra low-k materials and impact on interconnect propagation performance

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Dates et versions

hal-00397857 , version 1 (23-06-2009)

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  • HAL Id : hal-00397857 , version 1

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M. Gallitre, B. Blampey, B. Fléchet, A. Farcy, V. Arnal, et al.. First evidence of dielectric loss effects with ultra low-k materials and impact on interconnect propagation performance. Materials for Advanced Metallization Conf, Mar 2008, -, France. ⟨hal-00397857⟩
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