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Article Dans Une Revue Journal of Applied Physics Année : 2007

Influence of the reactor walls composition on radicals' densities and total pressure in Cl2 inductively coupled plasmas: I. Without silicon etching

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hal-00397074 , version 1 (19-06-2009)

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  • HAL Id : hal-00397074 , version 1

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G. Cunge, N. Sadeghi, R. Ramos. Influence of the reactor walls composition on radicals' densities and total pressure in Cl2 inductively coupled plasmas: I. Without silicon etching. Journal of Applied Physics, 2007, pp.102, (2007), 093304. ⟨hal-00397074⟩
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